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Tag: Nano Imprinting

超穎透鏡奈米結構特寫、Close-up of metalens nanostructures

The next generation of lens technology? The birth of the Super Lens.

When we take a photo with our phone, put on VR glasses, or see LiDAR scanning in a car, we are actually dealing with "lenses." Over the past century, lenses have evolved from single-element spherical lenses to multi-element lenses in order to correct aberrations.
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奈米壓印 Lithography 以直接壓模複製 10 nm 等級圖形,設備成本僅 EUV 一成、能耗降九成。本文深入比較解析度、產能、L10 模具壽命與缺陷密度,解析 Canon 與 EVG 最新試產數據,評估 NIL 在 2 nm 節點取代或補位光刻的可行性,並指出未來混合製程發展方向。

Will nanoimprint lithography (NIL) replace photolithography?

Nanoimprint lithography directly replicates 10 nm-level patterns using imprinting, with equipment costs only 10% of EUV and energy consumption reduced by 90%. This article provides an in-depth comparison of resolution, throughput, and L1 resolution.
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