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Month: July 2025

高溫真空硬焊爐內部 Interior of a vacuum brazing furnace

What is vacuum soldering? Learn the core technology of fluxless, high-reliability bonding in 5 minutes.

Vacuum brazing is a process that uses a filler metal with a lower melting point than the base metal to perform "liquid phase diffusion bonding" in a high vacuum environment. Because the residual oxygen in the furnace is extremely low, oxygen is avoided...
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模具內置感測器示意 Mold-embedded sensor illustration

Key technologies for injection molding quality monitoring – in-mold pressure and temperature sensors

By embedding pressure and temperature sensors directly into the injection mold, the actual PT curve of the melt in the mold cavity can be monitored simultaneously. Through closed-loop fine-tuning of holding pressure and cooling time, warpage and short-shot defects are significantly reduced, and yield can be improved.
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晶圓退火瞬熱特寫 Wafer rapid anneal close-up

What exactly does annealing do in semiconductor manufacturing? A complete analysis from activation to stress release.

Annealing is a crucial step in semiconductor manufacturing processes for activating doping and repairing defects. This article provides an in-depth comparison of temperature spikes, thermal budgets, and uniformity in furnace tube, RTA, LSA, and microwave annealing, and explains how...
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碳纖維HP-RTM成型與高壓釜 Carbon fiber HP-RTM & autoclave

How to mass-produce carbon fiber composites? 5 key differences and application guidelines between hot pressing and high-pressure RTM.

Mass production of carbon fiber composites is no longer expensive and slow! This article compares the pressure, cycle time, porosity, and material cost of hot pressing and high-pressure RTM, and analyzes Kamal-Sourour...
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奈米壓印 Lithography 以直接壓模複製 10 nm 等級圖形,設備成本僅 EUV 一成、能耗降九成。本文深入比較解析度、產能、L10 模具壽命與缺陷密度,解析 Canon 與 EVG 最新試產數據,評估 NIL 在 2 nm 節點取代或補位光刻的可行性,並指出未來混合製程發展方向。

Will nanoimprint lithography (NIL) replace photolithography?

Nanoimprint lithography directly replicates 10 nm-level patterns using imprinting, with equipment costs only 10% of EUV and energy consumption reduced by 90%. This article provides an in-depth comparison of resolution, throughput, and L1 resolution.
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